OVERVIEW

  • Our vision revolves around several platforms for highly  effective systems  with a nature inspired approach, an interfacial assembly and combination for multi-functional systems and, large-area processing. 

  •  Structured stimuli responsive nano architectures include particular nano/micro patterns, structural interlocking, and molecular level assembly.   

  • The programmable nano-architectures are investigated with understanding of detail physics and interactions in nature for bio-integrative, and energy, environmental applications.

  • We intend to focus on multiplex and flexible devices for tools  of intelligent bioelectronics and medical devices interfaced with artificial intelligence.   

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NANO PROCESSING & MULTISCALE SURFACE ARCHITECTURES 

BIO-INSPIRED INTELLIGENT BIOELECTRONICS & E-SKIN 

ENERGY HARVESTING MATERIALS & DEVICES 

E-COMPOSITE MATERIALS for SMART TEXTRONICS 

 LATEST NEWS 

Bronze Prize of Mechanical Engineering Section, SAMSUNG Human Tech Thesis Prize (1ST Author)


"Nano-Velcro: High Adhesion-Hysteresis with Strongly Attachable and Easily Detachable Nanohairy Locking Induced

by Van der Waals Force" "

Changhyun Pang, Won Gyu Bae












왼쪽부터 주저자 방창현, 공동저자 배원규 군.


2010/02/24 - 지난 2월 24일 오전 11시 삼성전자 서울 서초동 사옥 5층 다목적홀에서 열린 제 16회 ‘휴먼테크 논문 대상’ 시상식에서 우리 실험실의 방창현 박사과정, 배원규 석사과정이 동상을 수상하였다. 16회째인 이번 행사에는 101개교에서 1313편의 논문을 응모했다. 500여 명의 심사위원이 석 달간 심사해 10편의 금상 등 총 92편의 수상작을 선정했다.

<방창현 박사과정, 배원규 석사과정 / 동상 (Mechanical Engineering 분과)>

- 논문 제목 : 나노 벨크로: 반데르발스 힘에 의한 초접착 및 탈착 이력의 나노헤어 체결시스템

- 논문 내용 : 기존 Hook & Loop 형의 벨크로와는 다른 나노헤어들의 반데르발스 힘에 의한 초접착 및 탈착 이력을 가진 경제적인 신개념 나노벨크로 체결시스템 기술을 개발하였다.

Media Link-> http://news.joins.com/article/aid/2010/02/23/3633851.html


Our paper “Kinetic Modeling of Temperature Dependence of TiCl4 and NH3 Surface Reaction in Trap Systems for CVD Reactors (I&ecr, Pang et al), ” was featured in VerticalNew of Engineering Business Journal (USA Presses).


http://www.verticalnews.com/premium_newsletters/Engineering-Business-Journal/2009-03-11/67512EBJ.html

Research from C. Pang and co-researchers in the area of chemical engineering published


"The chemical vapor deposition (CVD) of titanium nitride (TiN) thin film has been a widely adopted, process for the fabrication of diffusion barrier layers in microelectronic fabrication processes. TiCl4(NH3)(2) is known to be formed as a solid product in the downstream of the CVD chambers and causes damages to the pumping systems," researchers in South Korea report.

"To prevent such damage, trap systems are installed between the process chamber and pumps. This study focuses on the flow, temperature, and reaction kinetic modeling of the chemical fort-nation of TiCl4(NH3)(2) in the trap system by computational fluid dynamics (CFD)," wrote C. Pang and...


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